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Model: SMD-2400F/SMD-3400

Model: SMD-2400F / SMD-3400

Sputtering System

This is one of the Model: SMD with a total sales record of over 1,400 units. It is a multi-chamber sputtering system designed for forming metal films, ITO, IGZO, dielectric films, and more, primarily that is mainly used in the high-definition display industry.

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Features

  • High productivity
  • Automated film process tuning technology.

Applications

  • TFT (Thin-film transistor) for large displays

Specifications

Model G8.5~G8.6 G10.5
SMD-2400F SMD-3400
Substrate size (mm) 2200 × 2500 ~ 2290 × 2620 2940 × 3370
Deposition method Side deposition method substrate-fixed deposition
Chamber configuration 1) Loading/Unloading position 1
2) Loading/Unloading chambers 1
3) Heating chambers 1
4) Sputter chambers Max 4
High vacuum evacuation system Turbo molecular pump
Substrate transfer system Tray + magnetic levitation transfer system