Model: ei-5、EVD-600LP

Model：ei-5、EVD-600LP

Evaporation System

The batch-type high-vacuum evaporation systems include the versatile Model: ei-5, designed for research and small-scale production, and the production-oriented Model: EVD-600LP, ideal for lift-off processes. These systems are designed for depositing metals and oxides onto substrates and feature centralized control from the operation panel, allowing automatic management of both exhaust and deposition processes.

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Features

Model： ei

  • Supports various evaporation sources (EB, RH, EB + RH etc.).
  • Substrate holders tailored to the process (lift-off, planetary, satellite, etc.).
  • Excellent operability and features via PC (recipe function, data logging, maintenance assist functions).
  • Compatible with substrates ranging from Φ50 to Φ200mm, rectangular substrates, Si, compound materials, glass, ceramics, etc.

Model： EVD

  • Improved lift-off performance allows for mounting more substrates.
  • Supports various evaporation sources (EB, RH, EB + RH etc.).
  • Excellent operability and features via PC (recipe function, data logging, maintenance assist functions).
  • Compatible with substrates ranging from Φ50 to Φ200mm, rectangular substrates, Si, compound materials, glass, ceramics etc.

Applications

  • Compound-related devices for Power devices
  • LED, LD and high-speed devices
  • Various R&Ds activities
  • Other general electronic devices

Specifications

Model ei-5 EVD-600LP
Wafer holder Revolution, Planetary, Satellite Planetary
SS distance 680mm 730mm
Incidence angle 4.3°　Φ100mm
6.4°　Φ150mm		 約4°　Φ100mm
約6°　Φ150mm
Evaporation source EB gun, Resistance heating
Standard pumping system 16” Cryo pump