Perfect for research and development on small samples
Capable of high-speed heating, high-speed cooling, and clean heating. This small, low-cost Infrared Lamp Heating System combines a temperature controller and a variable atmosphere chamber, capable of heating in an adjustable atmosphere. Heating operations can be performed on a PC via a USB connection and data can be easily managed.
FeaturesApplicationsSpecifications
- 50 °C/s high-speed heating
- Selectable atmosphere: vacuum, gas, gas flow, air
- Precise temperature control
- Compact, table-top design
- Crystal annealing of ferroelectric thin films
- Diffusion annealing after ion implantation and oxide film generation annealing
- Sintering and alloying treatments of Si and compound wafers
- Burn annealing of glass substrates
- Thermal cycle, thermal shock, thermal fatigue tests
- Temperature-programmed desorption tests, catalytic effect tests
| Type | MILA-5000-P-N (Near-infrared type) |
MILA-5000-P-F (Far-infrared type) |
|---|---|---|
| Temperature Range | RT to 1200 °C | RT to 800 °C |
| Maximum heating rate ※ | 50℃/s(50℃～1200℃）in vacuum atmosphere 45℃/ｓ(50℃～1200℃）in nitrogen gas |
4℃/s(50℃～800℃）in vacuum atmosphere 4℃/ｓ(50℃～800℃）in nitrogen gas |
| Temperature uniformity ※ | ±2.0℃（ΔT=4℃）at 1200℃ in vacuum atmosphere ±4.5℃（ΔT=9℃）at 1200℃ in nitrogen gas |
±1.8℃（ΔT=3.6℃）at 500℃ in vacuum atmosphere ±1.2℃（ΔT=2.4℃）at 500℃ in nitrogen gas |
| Lamp | Near-infrared lamp | Far-infrared lamp |
| Sample Size | 20 mm square x 2 mm thickness | |
| Measurement Atmosphere | Air, Vacuum, Gas flow | |
| Optional | Vacuum pumping equipment (rotary pump set) Cooling water circulation unit |
|
※The heating rate and temperature uniformity above are the measured values of a 20mm deep × 20mm wide × 0.5mm thick nickel plate.
※Subject to change depending on material and size.
