This is the only vacuum deposition system capable of creating nanoparticles and nano thin film with new specific capacities by generating metal ions through pulse arc discharge.
This system is used to create nano particles for electrode catalyst, photocatalyst and exhaust gas catalyst of fuel cells, also to form special materials such as hard thin film, magnetic film, lithium ion and battery electrode.By adding Arc Plasma Source APS-1, alloying two or three metals can be possible.

 

 

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[su_tab title=”Features”]

  • The system can select nano-particle diameter within the range of approx. 1.5nm to 6nm by changing condenser capacity.
  • The system can make any material plasmatic in case they are electrically-conductive materials(target).
    *Specific resistance for target is 0.01 ohm cm or less

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[su_tab title=”Applications”]

  • APD-P type (for support of nano particle to powder)Fuel cell catalyst, exhaust gas catalyst, photocatalyst with use of nano particle
    VOC dispersed catalyst, carbon nano tube catalyst, plasmon
  • APD-S type(substrate deposition)

    Metal thin film(magnetism, plasmon, protection film

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[su_tab title=”Specifications”

Type

APD-P
(Support to powders model)

APD-S
(Substrate deposition model)

Temperature Range RT *1 RT~500 °C
Powder vessel / Substrate
Size
Powder 
vessel (inside dimension):
φ 95mm × H 30 mm
with stirring mechanism
Powder fill ration: 13 to 20 cc
Substrate
φ 2-inch
Deposition atmosphere Vaccum, Low pressure process gas (N2, H2, Ar, O2)
Standard Deposition numbers *2

*1: Deposition with up to 500℃ is available as an option.
*2: The number of deposition sources can be reviewed and recommended according to your needs.

Common Specifications

  1. Chamber size: W400mm X D400mm X H300mm
  2. Exhaust system: Turbo-molecular pump unit 450L/s
  3. Arc Plasma source: Standard type 1 unit(3 unit at the maximum)
  4. Deposition atmosphere: Vacuum and 、low pressure rocess gas(N2、H2、Ar and O2)
    *Gas is optional
  5. Target: Electrically-conductiv materials(φ10 X L17mm)cylinder is also acceptable.
  6. Target specific: 0.01 ohm cm or less
  7. Condenser capacity: 360 μF X 5 pcs.(selectable)
  8. Pulse rate: 1,2,3,4,5 pulse/s
  9. Machine operation: Touch panel type
  10. Discharge voltage: 70V to 400V(Maximum 150V at 1800μF)

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[su_tab title=”Mechanism”]

After chamber evacuation, a trigger induces an arc discharge on the surface of target rod. Then highly ionized metal plasma is generated from the target rod without any discharge gases, and deposits on the substrate to form various thin films and nano-particles.

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[su_tab title=”Five Features”]

  • The system can select nano-particle diameter within the range of approx. 1.5nm to 6nm by changing condenser capacity.
  • The system can make any material plasmatic in case they are electrically-conductive materials(target). 
    *Specific resistance for target is 0.01 ohm cm or less
  • The system can readily generate oxide and nitride by changing atmosphere.
    Also, when graphite is discharged in H2 gas, it generates UNCD(Ultrananocrystalline diamond).
  • The nano-particles supported by the system shows active catalytic effects as compared with wet process.
  • Model APD-P supports nano-particles to powders. Model APD-S supports nano-particles to 2-inch substrate.
    *The above-mentioned 1, 3 and 4 depend on literatures.

Pt and Pd catalysts supported to CeO2 with Arc-Plasma method show higher catalytic activity for CO oxidation as compared with catalysts with conventional wet process.Quoted literatures: “Ministry of Education, element strategic project achievement” by Professor Machida at Kumamoto University

Relation between condenser capacity and nano-particle size

TEM image in which the system supports Pt to carbon powders
Quoted literatures: Article published by Mr. Tadahiro Fujitani at Research Institute for Innovation in Sustainable Chemistry in National Institute of Advanced Industrial Science and Technology

The difference in energies largely contributes to the generation and function of nano-particles. (The vertical axis is no unit of quantity required due to relative values.) Quoted literatures: Arc-plasma J. Appl. Phys. 101(2007)043304 SputterJ. Appl. Phys. 35(1964)1819

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