Power Generator 's ULVAC offers a variety of electronic guns and power supplies that support evaporation deposition technology.
DC Power Supply
DC power supply designed for sputtering system. It has high versatility and reliability based on our knowhow including application.
Our DC power supply lineup has various features.
DC PULSE Power Supply
Pulsed DC power supply designed for sputtering system. High suppressing effect of abnormal discharge is expected in
reactive sputtering process. Our pulsed DC power supply lineup has various features.
MF Power Supply
MF power supply for dual cathode sputtering system. It is suitable for not only metal film deposition but also reactive deposition.
Stable sputtering process can be realized without anode loss.
RF Power Supply
RF power supply for plasma process with 13.56MHz, 0.5kW/1/kW/3kW/5kW output. Compact and lightweight by
implementing a high efficiency RF amplifier. RF power supply has a built-in auto matching controller function,
power control of the RF power supply and matching system control can be performed with the main unit alone.
Power Supply RFS-N Series
Optional / PHS Series
Matching Box MBX-N Series
Optional / EXN Series
Optional / EXO Series