Power Generator ‘s ULVAC offers a variety of electronic guns and power supplies that support evaporation deposition technology.
DC power supply designed for sputtering system. It has high versatility and reliability based on our nowhow including application. Our DC power supply lineup has various features.
The DC-2/DC-4 are 2 kW/4 kW DC power generators for sputtering. Repeatability is excellent because of high control accuracy.
In the reactive sputtering processes, the A2K series abnormal discharge prevention unit applies positive voltage pulses to a DC power generator to neutralize the charge on the target.
The DC-10/DC-20 are 10kW/20kW DC power generators for sputtering. They are made of reliable components and circuits. T
MFU-20K is a unit which converts the DC output into bipolar pulse output, by adding to ULVAC DC power generator. It contributes to improved productivity and throughput at low cost.
DC-10-D and DC-20-D are DC power supplies for sputtering with 10kW and 20kW output. It consists of reliable parts and circuits.
As the basic performance is a matter of course, DCS series provides superior cost performance and is used in various applications. Combination use of the arc suppression unit, A2K, is effective well in reactive sputtering.
RMG-1303 is a 13.56MHz, 300W output matching unit integrated RF power supply for use in plasma processes such as RF sputtering and plasma CVD etching.
RF power supply for plasma process with 13.56MHz, 0.5kW/1/kW/3kW/5kW output. Compact and lightweight by implementing a high efficiency RF amplifier.
This is a matching box for the RFS series.
RF power supply for plasma process with 13.56MHz, 0.5kW/1/kW/3kW/5kW output. Compact and lightweight by implementing a high efficiency RF amplifier.
RF power supply for plasma process with 13.56MHz, 0.5kW/1/kW/3kW/5kW output. Compact and lightweight by implementing a high efficiency RF amplifier.
This is a switching device for the matching box of the power supply for plasma generation such as RF sputtering, plasma CVD, and etching.
RF power supply for plasma process with 13.56MHz, 0.5kW/1/kW/3kW/5kW output. Compact and lightweight by implementing a high efficiency RF amplifier.
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