Power Generator / Power Supply

Power Generator ‘s ULVAC offers a variety of electronic guns and power supplies that support evaporation deposition technology.

DC Power Supply / DC PULSE Power Supply

DC power supply designed for sputtering system. It has high versatility and reliability based on our nowhow including application. Our DC power supply lineup has various features.

DC-2 / DC-4

The DC-2/DC-4 are 2 kW/4 kW DC power generators for sputtering. Repeatability is excellent because of high control accuracy.

A2K Series

In the reactive sputtering processes, the A2K series abnormal discharge prevention unit applies positive voltage pulses to a DC power generator to neutralize the charge on the target.

DC-10-AM

The DC-10/DC-20 are 10kW/20kW DC power generators for sputtering. They are made of reliable components and circuits. T

MFU-20K

MFU-20K is a unit which converts the DC output into bipolar pulse output, by adding to ULVAC DC power generator. It contributes to improved productivity and throughput at low cost.

DC-10-D

DC-10-D and DC-20-D are DC power supplies for sputtering with 10kW and 20kW output. It consists of reliable parts and circuits.

DCS0052B

As the basic performance is a matter of course, DCS series provides superior cost performance and is used in various applications. Combination use of the arc suppression unit, A2K, is effective well in reactive sputtering.

RF Power Supply /RF Power Supply / Matching box

RMG-1303

RMG-1303 is a 13.56MHz, 300W output matching unit integrated RF power supply for use in plasma processes such as RF sputtering and plasma CVD etching.

RFS-1330N

RF power supply for plasma process with 13.56MHz, 0.5kW/1/kW/3kW/5kW output. Compact and lightweight by implementing a high efficiency RF amplifier.

RF Power Matching Box

This is a matching box for the RFS series.

RFS-1305N

RF power supply for plasma process with 13.56MHz, 0.5kW/1/kW/3kW/5kW output. Compact and lightweight by implementing a high efficiency RF amplifier.

RFS-1350N

RF power supply for plasma process with 13.56MHz, 0.5kW/1/kW/3kW/5kW output. Compact and lightweight by implementing a high efficiency RF amplifier.

RF Power Supply Option

This is a switching device for the matching box of the power supply for plasma generation such as RF sputtering, plasma CVD, and etching.

RFS-1310N

RF power supply for plasma process with 13.56MHz, 0.5kW/1/kW/3kW/5kW output. Compact and lightweight by implementing a high efficiency RF amplifier.