Power Generator (DC/RF)

Power Generator ‘s ULVAC offers a variety of electronic guns and power supplies that support evaporation deposition technology.

     DC Power Supply

     DC power supply designed for sputtering system. It has high versatility and reliability based on our knowhow including application.
     Our DC  power supply lineup has various features.

MFU Series

DCS Series

     DC PULSE Power Supply

     Pulsed DC power supply designed for sputtering system. High suppressing effect of abnormal discharge is expected in
     reactive sputtering  process. Our pulsed DC power supply lineup has various features.

     MF Power Supply

     MF power supply for dual cathode sputtering system. It is suitable for not only metal film deposition but also reactive deposition.
     Stable sputtering process can be realized without anode loss.

MFU Series

     RF Power Supply

     RF power supply for plasma process with 13.56MHz, 0.5kW/1/kW/3kW/5kW output. Compact and lightweight by
     implementing a high  efficiency RF amplifier. RF power supply has a built-in auto matching controller function,
     power control of the RF power supply and matching system control can be performed with the main unit alone.

Power Supply RFS-N Series

Optional / PHS Series

Matching Box MBX-N Series

Optional / EXN Series

Optional / EXO Series